This Mark 50 system is upgraded by vertically mounting a VAT high vacuum valve to the chamber for direct cryopump access. Its vertical sealing plane prevents falling particles from interfering with the seal. The horizontal, 32-by-32 inch cylindrical chamber, offers a low profile for easy loading and unloading. The unique slide-down door minimizes floor-space requirements. The system is designed for fast servicing as well as operator efficiency. The pumping array can be quickly released from the chamber, and the trap array rolls out.
The CHA Mark 50 can be supplied with any type of source that is commercially available.
The system can be equipped with quartz-lamp heaters of up to 16 kW to produce wafer temperatures of over 500°C. The chamber design accommodates either conventional or backside heater placement.
An optional ion beam source can be integrated into the Mark 50 to achieve a pre-cleaning action prior to deposition for removal of water vapor and other matter from the substrate surface. During the deposition cycle, the ion beam operates to etch the surface, enhancing deposited film quality. This feature is popular with optical coaters for anti reflective (AR) coatings.
An optional laminar-flow attachment (above the process chamber) sends a curtain of filtered air across the chamber door. This protection from foreign matter permits system installation in less rigidly controlled environments.
SCT integrates GE Fanuc as the system software interface for PLC. In addition to the process controller, the built in control console houses source power supplies, thickness and rate monitors, tape reader, dual ion-gauge switch, dual thermocouple gauge and auto ranging, automatic vacuum control, heater power supply and the circuit breaker panel.
System Control Technology