As with the 903, the MRC 943 utilizes single pass deposition with a constant source to substrate distance. RF and DC capability exists at each cathode position. Various sizes of substrate can be processed.
The dual level cryopumped high vacuum loadlock makes the 943 a high throughput production system. The loadlock pumps down from atmosphere to 3x10-6 Torr in five minutes.
The 943 allows for fully automated production. With GE Fanuc PLC running the system's mechanical and electrical features, immediate notification is given when parameters vary unacceptably from user-present values.